Silicon belongs to the semiconductor element, that is, under certain conditions will be conductive, but in others there will not be conductive under certain conditions. Weak from the element or elements in the water can not be easily ionized water purification technology, conventional and effectively removed. Ultra-pure water in the production process, when nearly exhausted ion exchange resins, silicon and boron are the first into the water a class of ions. In this paper, these two elements in the water purification process behavior. Combination of reverse osmosis technology and continuous electro-deionization technology, pre-processing process can effectively remove boron and silicon elements. In the preprocessing step, get high resistivity of the water, this low concentration of water purification process can be reduced later to remove the burden of ion resin.
     In addition, a special chelating agents can increase the retention rate of boron. This paper describes the evaluation of water quality of the important parameters. Production of ultra-pure water can be applied to accuracy of ppt level trace analysis, for boron-sensitive experiments can also be achieved through specific design.